Depth Profiling and Surface Analysis
Secondary Ion Mass Spectrometry (SIMS)
The Cameca IMS-7f magnetic sector SIMS instrument brings to PSI the capability of depth profiling with high sensitivity (ppm to ppb concentrations) that can be used to profile dopants and contamination in a range of semiconductor materials (Si, GaAs, GaN, etc.).
Typical SIMS applications include:
- Dopant/implant characterization
- Analysis of nitrided gate oxides
- Contamination in Cu metallization
- Surface metal contamination measurement
- Atmospheric (O, C, N and H) contamination characterization
Phi Quantera Scanning X-ray microprobe
Small Spot X-ray Photoelectron Spectroscopy (XPS) using the Phi Quantera Scanning X-ray microprobe. The Quantera delivers the ability to perform XPS analysis on spots as small as 20 microns and do XPS imaging with ~ 10 micron lateral resolution.
Typical XPS applications include:
- Unknown contamination identification on small features
- Chemical bonding information (both surface and in-depth)
- Chemical composition information
- Dopant/implant characterization
- Analysis of nitrided gate oxides
- Contamination in Cu metallization
- Surface metal contamination measurement
- Atmospheric (O, C, N and H) contamination characterization
- Unknown contamination identification on small features
- Chemical bonding information (both surface and in-depth)
- Chemical composition information